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Proceedings Paper

Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching
Author(s): Jinsong Wang; Yang Zhao; Guangzhao Mao
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Paper Abstract

Two-dimensional periodic structures with nanometer feature sizes have been widely used in many photonic devices. The profile and size of the nanostructure elements can greatly affect optical performances. Various practical subwavelength structures working in the visible and near infrared region have been fabricated using electron-beam writing or laser interference techniques. In this paper, we present a new technique which use nanosphere lithography (NSL) and reactive-ion etching to fabricate two-dimensional nanostructures with tunable nanoelement size and profile.

Paper Details

Date Published: 29 August 2006
PDF: 8 pages
Proc. SPIE 6308, Photonics for Space Environments XI, 63080H (29 August 2006); doi: 10.1117/12.679628
Show Author Affiliations
Jinsong Wang, Wayne State Univ. (United States)
Yang Zhao, Wayne State Univ. (United States)
Guangzhao Mao, Wayne State Univ. (United States)


Published in SPIE Proceedings Vol. 6308:
Photonics for Space Environments XI
Edward W. Taylor, Editor(s)

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