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Proceedings Paper

Graded multilayers for focusing hard x-rays below 50 nm
Author(s): Ch. Morawe; O. Hignette; P. Cloetens; W. Ludwig; Ch. Borel; P. Bernard; A. Rommeveaux
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Paper Abstract

Laterally graded W/B4C multilayers were conceived for the focusing of hard X rays at 3rd generation synchrotron sources. They were deposited using a differential sputter coating technique. The multilayer mirror was bent to the correct shape on a dynamical bending device applying automated alignment routines. During experiments on the ESRF beamline ID19 the undulator source was focused vertically to a 41 nm (FWHM) wide line using a photon energy of 24 keV. The measured line width can be attributed to the finite source size, to diffraction effects, and to slope errors of the mirror. The potential impact of beam penetration into the multilayer will be discussed.

Paper Details

Date Published: 29 August 2006
PDF: 11 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170F (29 August 2006); doi: 10.1117/12.679039
Show Author Affiliations
Ch. Morawe, European Synchrotron Radiation Facility (France)
O. Hignette, European Synchrotron Radiation Facility (France)
P. Cloetens, European Synchrotron Radiation Facility (France)
W. Ludwig, European Synchrotron Radiation Facility (France)
Ch. Borel, European Synchrotron Radiation Facility (France)
P. Bernard, European Synchrotron Radiation Facility (France)
A. Rommeveaux, European Synchrotron Radiation Facility (France)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

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