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Proceedings Paper

Coherences between influence function size, polishing quality, and process time in magnetorheological finishing
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Paper Abstract

Magnetorheological finishing (MRF) is a computer controlled polishing process (CCP), which is commonly used in the field of high quality optical lens production. The process uses the material removal characteristic of the polishing tool (influence function) and the surface error-profile to calculate individual, surface error-profile dependent polishing sequences. At the University of Applied Sciences Deggendorf a testing series with a magnetorheological finishing machine has been performed, and effects of the influence function size and its removal capacity on the polishing quality and the process time have been investigated. The result of the research shows that the influence function size has a major effect on the process time, whereas the polishing quality is nearly independent of the influence function size. During the testing series the process time was significantly reduced using an appropriate influence function size. The process time decreased about 9% relating to the original influence function.

Paper Details

Date Published: 8 September 2006
PDF: 9 pages
Proc. SPIE 6288, Current Developments in Lens Design and Optical Engineering VII, 62880Q (8 September 2006); doi: 10.1117/12.678720
Show Author Affiliations
Markus Schinhaerl, Univ. of Applied Sciences Deggendorf (Germany)
Univ. of the West of England (United Kingdom)
Andreas Geiss, Univ. of Applied Sciences Deggendorf (Germany)
Rolf Rascher, Univ. of Applied Sciences Deggendorf (Germany)
Peter Sperber, Univ. of Applied Sciences Deggendorf (Germany)
Richard Stamp, Univ. of the West of England (United Kingdom)
Lyndon Smith, Univ. of the West of England (United Kingdom)
Gordon Smith, Univ. of the West of England (United Kingdom)
Elmar Pitschke, Univ. of Applied Sciences Deggendorf (Germany)
Univ. of the West of England (United Kingdom)


Published in SPIE Proceedings Vol. 6288:
Current Developments in Lens Design and Optical Engineering VII
Pantazis Z. Mouroulis; Warren J. Smith; R. Barry Johnson, Editor(s)

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