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Proceedings Paper

Calculation of extended bidirectional reflectance distribution function for subsurface defect scattering
Author(s): Jian Shen; Shijie Liu; Weijin Kong; Zicai Shen; Jianda Shao; Zhengxiu Fan
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Paper Abstract

By introducing scattering probability and statistical distribution functions of substrate subsurface defects' radius, refractive indices and positions, extended bidirectional reflectance distribution function (BRDF) was derived on the foundation of Jones scattering matrix. A numerical calculation of the extended BRDF for p-polarization incident light has been performed by employing Monte Carlo method. The calculating results indicate that the extended BRDF depends strongly on incident angle, scattering angle and azimuth angle, and presents a specific symmetry. For real refractive index, the extended BRDF is independent of subsurface defects' positions. And the extended BRDF will provide a more precise model for the calculation and measurement of polarized light scattering resulting from subsurface defects.

Paper Details

Date Published: 23 February 2006
PDF: 5 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615035 (23 February 2006); doi: 10.1117/12.678595
Show Author Affiliations
Jian Shen, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Shijie Liu, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Weijin Kong, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Zicai Shen, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics, CAS (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

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