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Proceedings Paper

Method for measuring the granite surface topography of wafer stage with laser interferometer
Author(s): Le He; Xiangzhao Wang; Weijie Shi; Jianming Hu
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Paper Abstract

Topography of a granite surface has an effect on the vertical positioning of a wafer table in a lithographic tool, when the wafer table moves on the granite. The inaccurate measurement of the topography results in a bad leveling and focusing performance. In this paper, a method to measure the topography of a granite surface with high accuracy is presented. In this method, a double frequency laser interferometer is used to measure the tilts of the wafer table in the X and Y direction. From the tilts information, the height of every point on the surface can be obtained by a special algorithm. Then, according to the height information, a high order polynomial is fitted to express the topography of the granite surface with high accuracy. Experiment results shows that the measurement reproducibility of the method is better than 10 nm.

Paper Details

Date Published: 19 May 2006
PDF: 6 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615008 (19 May 2006); doi: 10.1117/12.676906
Show Author Affiliations
Le He, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Graduate School of Chinese Academy of Sciences (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Graduate School of Chinese Academy of Sciences (China)
Weijie Shi, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Graduate School of Chinese Academy of Sciences (China)
Jianming Hu, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Graduate School of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

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