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Proceedings Paper

Coma aberration measurement by lateral image displacements at different defocus positions
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Paper Abstract

As critical dimension shrinks, the effect of coma aberration on the performance of modern lithographic tools has become increasingly obvious. So, research on high-accuracy in-situ measurement of coma aberration is necessary. In this paper, a new method to measure coma aberration in projection system is proposed. The principle of the method is described in detail. The coma-induced image displacements are simulated at different defocus positions by simulation program PROLITH. The sensitivity coefficients of coma aberration are calculated. The advantage of the method is that the measurement accuracy of coma aberration can increase approximately by 25% compared with commonly used TAMIS method.

Paper Details

Date Published: 19 May 2006
PDF: 6 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615003 (19 May 2006); doi: 10.1117/12.676894
Show Author Affiliations
Mingying Ma, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Fan Wang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Weijie Shi, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)
Dongqing Zhang, Shanghai Institute of Optics and Fine Mechanics, CAS (China)
Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

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