Share Email Print
cover

Proceedings Paper

Porous silicon reflectance interference filter used for liquid concentration measurement
Author(s): Fengcheng Teng; Shuxin Qiao; Yanan Cai; Tihua Wu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The aim of the work described in the paper is to fabricate Bragg type porous silicon reflectance interference filters (PSRIF) with optimum quarter wave layer by pulsed etching and to study its application in liquid concentration measurement filed based on reflectance peak shift with ethanol as sample. Orthogonal method has been adopted to optimize fabrication parameters. Under optimal condition, current applied to layers with high and low index were 3.8 mA /35 mA with anodic duration of 36.0 s/3.0 s, pulse interval of 50 ms and duty cycle of 50, and optimal repetition of quarter wave layer with low and high indexes was 6. In room temperature, the full width at half maximum of light emission peak is 13 nm and position of reflectance peak was 475.6 nm. Thereafter, as-prepaired porous silicon was used to measure liquid concentration. Results show that reflectance peak of PSRIF filled with ethanol shifts to longer direction compared to that of as-prepared samples and the shift is proportional to ethanol concentration. The regularity fits sodium chloride and sucrose as well.

Paper Details

Date Published: 19 May 2006
PDF: 5 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 61502B (19 May 2006); doi: 10.1117/12.676886
Show Author Affiliations
Fengcheng Teng, Yanshan Univ. (China)
Shuxin Qiao, Yanshan Univ. (China)
Yanan Cai, Yanshan Univ. (China)
Tihua Wu, Yanshan Univ. (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

© SPIE. Terms of Use
Back to Top