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Proceedings Paper

New method for studying the relationship between morphological parameters and cell viability
Author(s): Jianwen Xiong; Weiping Dai; Li Chen; Guixiang Liu; Mingsheng Liu; Zhenxi Zhang; Hua Xiao
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Paper Abstract

Based on the morphological differences between normal, apoptosis and necrosis cell, a new method for detection cell viability is presented in the paper. The Jurkat cells samples were used for studying the relationship between morphological parameters and cell viability in the paper. According to the scatter charts of Jurkat cell roundness, radius ratio and area, the cell areas were mainly distributed from 40 μm2 to 80 μm2. The percentage of main areas in the two cells samples were analyzed statistically with values of 62.37% and 75.45 % respectively. Due to the mostly normal cell used by the experiment in the exponent growth period, a conclusion that the areas of normal cells were mainly distributed from 40 μm2 to 80 μm2 is presented. And the areas of apoptosis and necrosis cells are distributed in other range, i.e. less than 40 μm2 or more than 80 μm2. There are not any chemical medicaments needed to add in the samples by the method based on the videopicture in order to detect the states of cell samples. What it reflected by analyzing morphological parameters of cell are the true states of cell.

Paper Details

Date Published: 23 February 2006
PDF: 5 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615043 (23 February 2006); doi: 10.1117/12.676524
Show Author Affiliations
Jianwen Xiong, Xi'an Jiaotong Univ. (China)
South China Normal Univ. (China)
Weiping Dai, South China Normal Univ. (China)
Li Chen, Guangdong Univ. of Technology (China)
Guixiang Liu, Hunan Shaoyang Univ. (China)
Mingsheng Liu, South China Normal Univ. (China)
Zhenxi Zhang, Xi'an Jiaotong Univ. (China)
Hua Xiao, South China Normal Univ. (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

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