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Proceedings Paper

Spectroscopic investigation of high-pressure micro-hollow cathode discharges
Author(s): Chao Jiang; Youqing Wang
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Paper Abstract

Micro-hollow cathode discharge (MHCD), as a high-pressure glow discharge, has many applications in industry. Theclosed-MHCD is investigated experimentally in argon in the paper. The relations between breakdown voltages of glow discharge and gas pressure in argon are measured. Minimum breakdown voltages obtained, are about 520V at 200Torr argon. The differential resistivity of the voltage-current characteristics for all of the pressure studied is positive. Strong optical emission from the closed-MHCD is also observed. Measurement of electron temperature is carried out by optical emission spectroscopy. The electron temperature was about 1eV at the pressure from 200Torr to 760Torr and at the discharge current from 0.5mA to 10mA. An increase in pressure of the working gas leads to a slight decrease in electron temperature. The electron number density and gas temperature of closed-MHCD was investigated by diode laser atomic absorption spectroscopy. The gas temperature and the electron number density were evaluated from the analysis of the absorption line profiles, taking into account significant Stark broadening mechanisms. The gas temperature was found to increase with pressure from 1100K to 2100K. The electron number density was calculated from Stark broadening and shift, and it ranges from 7×1014 to 1.5×1015cm-3. Thus, the closed-MHCD is similar to MHCD, which has the non-equilibrium character with the advantage of high-pressure. And it can also be used for non-thermal plasma processing e.g. surface treatment, plasma chemistry and generation of UV and VUV radiation.

Paper Details

Date Published: 23 February 2006
PDF: 6 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 615040 (23 February 2006); doi: 10.1117/12.676518
Show Author Affiliations
Chao Jiang, Hubei Normal Univ. (China)
Huazhong Univ. of Science and Technology (China)
Youqing Wang, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

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