Share Email Print
cover

Proceedings Paper

Geometrical modulation transfer function of different active pixel of CMOS APS
Author(s): Jie Li; Jinguo Liu; Zhihang Hao
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The geometrical Modulation Transfer Function (MTF) of CMOS APS (active pixel sensor) is analyzed in this paper. Advanced APS have been designed and fabricated where different pixel shapes such as square, rectangle and L shape, were placed, because the amplifier circuit and other function circuits inter pixel of APS take up some pixel area. MTF is an important figure of merit in focal plane array imaging sensors. Research on analyzing the MTF for the proper pixel shape is currently in progress for a centroidal configuration of a target position. MTF will give us a more complete understanding of the tradeoffs opposed by the different pixel designs and by the signal processing conditions. Based on image sensor sampling and reconstructing model, the MTF expression of any active pixel shape has been deduced in this paper. According to actual pixel shape, three different active area pixels were analyzed, they were square, rectangle, and L shape, their Fill Factor (FF) is 30%, 44% and 55%, respectively. Results of simulation experiments indicate that different pixel geometrical characteristics contribute significantly to the figures of their MTF. Different geometrical shape of active sensitive area of pixel and different station in pixel would influence MTF figures. The analysis results are important in designing better APS pixel and more important in analyzing imaging system performance of APS subpixel precision system.

Paper Details

Date Published: 19 May 2006
PDF: 6 pages
Proc. SPIE 6150, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 61501Y (19 May 2006); doi: 10.1117/12.676404
Show Author Affiliations
Jie Li, Changchun Univ. (China)
Jinguo Liu, Changchun Institute of Optics, Fine Mechanics and Physics, CAS (China)
Zhihang Hao, Changchun Institute of Optics, Fine Mechanics and Physics, CAS (China)


Published in SPIE Proceedings Vol. 6150:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Xun Hou; Jiahu Yuan; James C. Wyant; Hexin Wang; Sen Han, Editor(s)

© SPIE. Terms of Use
Back to Top