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Proceedings Paper

The automatic back-check mechanism of mask tooling database and automatic transmission of mask tooling data
Author(s): Zhe Xu; M. G. Peng; Lin Hsin Tu; Cedric Lee; J. K. Lin; Jian Feng Jan; Alb Yin; Pei Wang
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Paper Abstract

Nowadays, most foundries have paid more and more attention in order to reduce the CD width. Although the lithography technologies have developed drastically, mask data accuracy is still a big challenge than before. Besides, mask (reticle) price also goes up drastically such that data accuracy needs more special treatments.We've developed a system called eFDMS to guarantee the mask data accuracy. EFDMS is developed to do the automatic back-check of mask tooling database and the data transmission of mask tooling. We integrate our own EFDMS systems to engage with the standard mask tooling system K2 so that the upriver and the downriver processes of the mask tooling main body K2 can perform smoothly and correctly with anticipation. The competition in IC marketplace is changing from high-tech process to lower-price gradually. How to control the reduction of the products' cost more plays a significant role in foundries. Before the violent competition's drawing nearer, we should prepare the cost task ahead of time.

Paper Details

Date Published: 20 October 2006
PDF: 12 pages
Proc. SPIE 6349, Photomask Technology 2006, 63493S (20 October 2006); doi: 10.1117/12.675392
Show Author Affiliations
Zhe Xu, He Jian Technology Co., Ltd. (China)
M. G. Peng, He Jian Technology Co., Ltd. (China)
Lin Hsin Tu, He Jian Technology Co., Ltd. (China)
Cedric Lee, He Jian Technology Co., Ltd. (China)
J. K. Lin, He Jian Technology Co., Ltd. (China)
Jian Feng Jan, He Jian Technology Co., Ltd. (China)
Alb Yin, He Jian Technology Co., Ltd. (China)
Pei Wang, He Jian Technology Co., Ltd. (China)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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