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Proceedings Paper

Fast and accurate non-contact in situ optical metrology for end-point detection
Author(s): Wojciech J. Walecki; Alexander Pravdivstev; Manuel Santos II; Ann Koo
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Paper Abstract

We present design of novel tool for end point detection of wafer thickness, and wafer topography employing low coherence fiber optic interferometer, which optical length of the reference arm of the interferometer is monitored by secondary long coherence length interferometer.

Paper Details

Date Published: 14 August 2006
PDF: 6 pages
Proc. SPIE 6292, Interferometry XIII: Techniques and Analysis, 629211 (14 August 2006); doi: 10.1117/12.675342
Show Author Affiliations
Wojciech J. Walecki, Frontier Semiconductor (United States)
Alexander Pravdivstev, Frontier Semiconductor (United States)
Manuel Santos II, Frontier Semiconductor (United States)
Ann Koo, Frontier Semiconductor (United States)

Published in SPIE Proceedings Vol. 6292:
Interferometry XIII: Techniques and Analysis
Katherine Creath; Joanna Schmit, Editor(s)

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