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Proceedings Paper

Multilayer optics with spectral purity layers for the EUV wavelength range
Author(s): E. Louis; R. W .E. van de Kruijs; A. E. Yakshin; S. Alonso van der Westen; F. Bijkerk; M. M. J. W. van Herpen; D. J. W. Klunder; L. Bakker; H. Enkisch; S. Müllender; M. Richter; V. Banine
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Paper Abstract

Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.

Paper Details

Date Published: 24 March 2006
PDF: 5 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615139 (24 March 2006); doi: 10.1117/12.675132
Show Author Affiliations
E. Louis, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
R. W .E. van de Kruijs, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
A. E. Yakshin, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
S. Alonso van der Westen, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
F. Bijkerk, FOM Institute for Plasma Physics Rijnhuizen (Netherlands)
M. M. J. W. van Herpen, Philips Research Labs. (Netherlands)
D. J. W. Klunder, Philips Research Labs. (Netherlands)
L. Bakker, Philips Research Labs. (Netherlands)
H. Enkisch, Carl Zeiss SMT AG (Germany)
S. Müllender, Carl Zeiss SMT AG (Germany)
M. Richter, Physikalisch-Technische Bundesanstalt (Germany)
V. Banine, ASML (Netherlands)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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