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Proceedings Paper

Optical spatial heterodyned interferometry for applications in semiconductor inspection and metrology
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Paper Abstract

Interferometric imaging has the potential to extend the usefulness of optical microscopes by encoding small phase shifts that reveal information about topology and materials. At the Oak Ridge National Laboratory (ORNL), we have developed an optical Spatial Heterodyne Interferometry (SHI) method that captures reflection or transmission images containing both phase and amplitude information at a high rate of speed. By measuring the phase of a wavefront reflected off or transmitted through a surface, the relative surface heights and some materials properties can be determined. In this paper we briefly review a variety of application areas where this technology has been applied including semiconductor wafer inspection, photolithographic mask metrology and inspection, and we conclude with a discussion regarding future work to apply SHI to MEMS device characterization.

Paper Details

Date Published: 9 June 2006
PDF: 10 pages
Proc. SPIE 6162, International Conference on Lasers, Applications, and Technologies 2005: Laser Sensing, Imaging, and Information Technologies, 616203 (9 June 2006); doi: 10.1117/12.674946
Show Author Affiliations
Kenneth W. Tobin, Oak Ridge National Lab. (United States)
Philip R. Bingham, Oak Ridge National Lab. (United States)


Published in SPIE Proceedings Vol. 6162:
International Conference on Lasers, Applications, and Technologies 2005: Laser Sensing, Imaging, and Information Technologies
Tito Arecchi; Igor P. Gurov; Toyohiko Yatagai; Vladislav Ya. Panchenko; Vladimir S. Golubev, Editor(s)

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