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Proceedings Paper

Measurement, separation, and amelioration of transverse scanning synchronization error
Author(s): Yuji Yamaguchi; Ranjan Khurana; Adlai H. Smith; Venky Subramony; Calvin Chen Chii Wean; Joseph J. Bendik
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Paper Abstract

The need for lithographic tool advances for reducing feature size, pitch (low k1 processing), and improving overlay stems directly from next generation circuit layout and performance roadmaps1. Overlay error or layer-to-layer misalignment tolerances have continued to decrease to the point where a few nanometers of misalignment can seriously impact process and device yields. In this work, we expand our previous work2 and introduce a new scanner aberration monitoring methodology that can both measure and deconvolve lens distortion from scanning synchronization error while simultaneously providing machine corrections for accurate tool matching. Experimental data taken from several machines suggests it is possible to ameliorate scanning synchronization error for each machine and improve tool-to-tool matching at the level required for next generation processing. Finally, we discuss applications of this new technology including practical fab implementation and discovering problematic scanning tool signatures.

Paper Details

Date Published: 21 March 2006
PDF: 12 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615443 (21 March 2006); doi: 10.1117/12.674471
Show Author Affiliations
Yuji Yamaguchi, Litel Instruments (United States)
Ranjan Khurana, TECH Semiconductor (Singapore)
Adlai H. Smith, Litel Instruments (United States)
Venky Subramony, TECH Semiconductor (Singapore)
Calvin Chen Chii Wean, TECH Semiconductor (Singapore)
Joseph J. Bendik, Litel Instruments (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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