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Proceedings Paper

The amendment of the removal function model in edge effect
Author(s): Wenjin Shang; Yifan Dai; Xusheng Zhou
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Paper Abstract

In computer controlled optical surfacing (CCOS), edge effect is a problem that needs to be solved as soon as immediately. When the polishing tool moves along the edge of the workpiece, the theoretical removal function model is not suitable for the machining practice. The pressure distribution is studied when the polishing tool goes beyond the border of the workpiece. The pressure distribution along the radius of the workpiece is presented and the calculation formula is given. The character of the pressure distribution is analyzed. On the basis of the analysis of the pressure distribution and the Preston hypothesis the amendment model of the removal function is established. The calculation formula of the amendment model is given and numeric analysis of the amendment model is processed. Using Matlab, the 3D simulation result of the amendment model is obtained. The removal profiles along X-axis and Y-axis are plotted. The characteristics of the amendment model are analyzed. Comparing the experiment results with the simulation results verifies the accuracy of the amendment model. Typical phenomena in experiments are analyzed and appropriate removal performance is illustrated. Our model correctly predicts that a greater amount of material is removed from the edge of the workpiece.

Paper Details

Date Published: 9 June 2006
PDF: 7 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614931 (9 June 2006); doi: 10.1117/12.674305
Show Author Affiliations
Wenjin Shang, National Univ. of Defense Technology (China)
Yifan Dai, National Univ. of Defense Technology (China)
Xusheng Zhou, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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