Share Email Print
cover

Proceedings Paper

Study of high transmittance shield film for microwave sulfur light
Author(s): Xinhua Fu; Lianhe Dong; Peng Lu; Weibo Duan; Xiumin Li
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The line width and period of the shield film were designed and optimized based on the principle of microwave transmission. The photolithography technology has been used to generate a photo mask. Then the mask was duplicated on the anti-refection coated fused silica substrate by adding metal and protective coatings with RF sputtering technology, followed by photoresist removing and other procedures. Finally, a high precision and dense metal shield film were developed on the substrate. A transmission of about 97% has been tested in the final result. A surface resistance of 30Ω/square has also been obtained. The microwave of 2.45GHZ has been completely shielded from radiation.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492Y (9 June 2006); doi: 10.1117/12.674301
Show Author Affiliations
Xinhua Fu, Changchun Univ. of Science and Technology (China)
Lianhe Dong, Changchun Univ. of Science and Technology (China)
Peng Lu, Changchun Univ. of Science and Technology (China)
Weibo Duan, Changchun Univ. of Science and Technology (China)
Xiumin Li, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

© SPIE. Terms of Use
Back to Top