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Proceedings Paper

Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering
Author(s): Junqi Xu; Lingxia Hang; Weiguo Liu; Huiqing Fan; Yingxue Xing
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Paper Abstract

Hydrogen-free carbon films were deposited and synthesized by unbalanced magnetron sputtering (UBMS) using a graphite target in Ar atmosphere. The ion beam flow density was measured by a Langmuir probe under the condition of deposition DLC films. The results indicated that this unbalanced magnetron sputtering system can obtain ion beam density as high as 2.0 mAcm-2 even at low pressure of 0.5 Pa with an excitation current of 120 A, far larger than 0.3 mAcm-2 in a conventional balanced magnetron sputtering (MS) system. Hydrogen-free carbon films were deposited by PVD method with a rectangle graphite target of 480×120 mm. The Raman spectrum of carbon film was presented. It was proved that the film's structure is a typical diamond-like carbon. The Raman intensity of diamond and graphite peak ID/IGis as high as 2.26. Surface morphology was investigated by using an Atomic Force Microscope (AFM). The image indicated that the surface of carbon films is smooth; with the grains size about 10 nm and the surface roughness Rα about 2.5 nm, respectively. IR spectrum presented high optical transparency of 61.4% coated on single side of Ge sample, and no obvious absorption peaks were founded between 5000 and 1000 cm-1 owe to lack of hydrogen.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61492S (9 June 2006); doi: 10.1117/12.674295
Show Author Affiliations
Junqi Xu, Northwestern Polytechnical Univ. (China)
Xi'an Institute of Technology (China)
Lingxia Hang, Xi'an Institute of Technology (China)
Weiguo Liu, Xi'an Institute of Technology (China)
Huiqing Fan, Northwestern Polytechnical Univ. (China)
Yingxue Xing, Xi'an Institute of Technology (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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