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Proceedings Paper

Study of a new portable x-ray source with micro-beam
Author(s): Kaige Wang; Ji Li; Qinlao Yang; Jinchuan Guo; Baoping Guo; Xiaomei Kuo; Junlan Zhou; Hanben Niu
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Paper Abstract

A novel X-ray source with micro-beam has been studied in theory and experiment. The source is composed of three portions: LaB6 crystal cathode electron gun emitting system, electrostatic focusing system, and permutable metal target system. The electronic current emitted by the electron-gun are controlled by modulating cathode temperature and Wehnelt grid voltage and ratio Dw/H, two-equal-radius-cylinder-electrodes focusing system concentrates electron beam, the X-ray photons are irradiated by high energy electron beam bombarding the metal target. The new x-ray source's general-purpose capabilities such as continuous radiation and pulse radiation, focus size and luminance, are also tested. When the temperature of LaB6 cathode is about 1900K and partial pressures being kept below 10-7 torr, the minimal focus diameter is merely about 10 microns. The new micro focus x-ray source has other lots of advantages such as economy, safety and facility.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491Z (9 June 2006); doi: 10.1117/12.674261
Show Author Affiliations
Kaige Wang, Shenzhen Univ. (China)
Xi'an Institute of Optics and Precision Mechanics (China)
Ji Li, Shenzhen Univ. (China)
Qinlao Yang, Shenzhen Univ. (China)
Jinchuan Guo, Shenzhen Univ. (China)
Baoping Guo, Shenzhen Univ. (China)
Xiaomei Kuo, Shenzhen Univ. (China)
Junlan Zhou, Shenzhen Univ. (China)
Hanben Niu, Shenzhen Univ. (China)
Xi'an Institute of Optics and Precision Mechanics (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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