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Proceedings Paper

Novel nano-scale overlay alignment method for room-temperature imprint lithography
Author(s): Li Wang; Yucheng Ding; Bingheng Lu; Zhihui Qiu
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Paper Abstract

A novel nano-scale alignment technique based on Moire fringe for room-temperature imprint lithography in the submicron realm is proposed. A pair of special slant gratings is used as alignment marks on the wafer and template respectively. Moire signals generated by alignment marks are projected onto a photo-detector array, then the detected signals are used to estimate the alignment errors in x and y directions respectively. Test results indicate that complex differential Moire signal is more sensitive to relative displacement of the pair of marks than each single Moire signal, and the alignment resolutions obtained in x and y directions are ±20nm (3σ) and ±25nm(3σ) respectively. They can meet the requirement of alignment accuracy for submicron imprint lithography.

Paper Details

Date Published: 9 June 2006
PDF: 6 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491V (9 June 2006); doi: 10.1117/12.674257
Show Author Affiliations
Li Wang, Xi'an Jiaotong Univ. (China)
Yucheng Ding, Xi'an Jiaotong Univ. (China)
Bingheng Lu, Xi'an Jiaotong Univ. (China)
Zhihui Qiu, Xi'an Jiaotong Univ. (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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