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Proceedings Paper

Study of the optical properties of ZnO thin films prepared by laser molecular beam epitaxy
Author(s): Zhongfeng Xu; Kairu Ju; Qing'an Xu
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Paper Abstract

ZnO thin films are prepared on sapphire (0001) substrate by laser molecular beam epitaxy (L-MBE) and the optical properties were studied. It is found that the growth conditions and the treat process have obvious effect on the optical properties of ZnO films. With the increase of the growth oxygen pressure, the concentration of the structural defects in ZnO films caused by the disbalance of Zn and O stoichiometric proportion is depressed effectively. As a result, the UV emission intensity grows much higher, but the deep level (DL) emission is depressed. Sample 1#, 2#, and 3# were grown at oxygen pressure 2.0E-3Pa, 8.0E-3Pa, 2.0E-2Pa respectively, and the ratio of the UV emission intensity and the DL emission intensity were 1.00, 2.34, 3.31 respectively. The effect of annealing treatment on the transmission spectra of ZnO films was also studied. Sample 1# was cut into three parts and annealed at 500oC, 600oC, 700oC respectively in the air atmosphere. The transmittivity in the visible range become much greater after annealing and the higher the annealing temperature is, the higher the transmittivity becomes. When annealed at 700oC, the transmittivity has nearly doubled.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491T (9 June 2006); doi: 10.1117/12.674255
Show Author Affiliations
Zhongfeng Xu, Xi'an Jiaotong Univ. (China)
Kairu Ju, Xi'an Jiaotong Univ. (China)
Qing'an Xu, Xi'an Institute of Optics and Precision Mechanics (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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