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Proceedings Paper

Polarization analysis for laser optical system
Author(s): Fan Yang; Zhiqiang Huang; Tingwen Xing
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Paper Abstract

In this paper we analyze the change of polarization state for a laser optical system which includes a Cassegrain beam expander and several fold mirrors. First, this system operates over a broad spectral band and is with several separated wavelengths, therefore, strong polarization effects will occur at certain waveband. The polarization state changes of different wavelengths at the exit pupil are discussed mainly based on the comparison of their Point Spread Function (PSF) and Strehl Ratio respectively. Then, fold mirrors cause large angles of incidence and can rotate in azimuth and zenith. The amplitude diattenuation and retardance are calculated at different azimuth and zenith of the beam director assembly. In this paper, Code-V commercial optical-engineering software is used to model the polarization behavior for the system. The factors mentioned above, which are spectral bandwidth, angle of incidence of surfaces and systemic coatings, are taken into consideration in the process of simulation. The result of the study shows that the polarization properties at certain wavelength are satisfactory except some other wavelengths are not. This laser system is more sensitive to retardance than to diattenuation. It is concluded that polarization is an important factor that affects the performances of the whole system and the design of laser optical system should take into account the polarization effects.

Paper Details

Date Published: 9 June 2006
PDF: 6 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614913 (9 June 2006); doi: 10.1117/12.674227
Show Author Affiliations
Fan Yang, Institute of Optics and Electronics (China)
Zhiqiang Huang, Institute of Optics and Electronics (China)
Tingwen Xing, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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