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Proceedings Paper

A Monte-Carlo study on numerical aperture of lens and size of focal spots in turbid medium
Author(s): Jie Wang; Zhi-lie Tang; Zu-kang Lu
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Paper Abstract

In general, the high resolution of a microscopy could be acquired by increasing the NA (numerical aperture) of lens, and simultaneously increasing the luminous flux. But many experiments shows: in turbid media, the NA of the lens we use is larger, the radius of focal spot is larger and the resolution decreases on the contrary. Because of highly scattering, there are different characters of focusing and propagation in turbid media .We simulate the process of photons motion in turbid media by means of Monte Carlo method according to a known model with representative parameter: changing the NA of lens in the program, the gray-scale images of the light spot in various layer are obtained. We also plot two figures; (1) distribution of the normalized light intensity versus the transverse axis; (2) the radius of light spots as a function of depth. In the figures: the trends of distribution of the normalized light intensity are coincident and centralized; when lens with larger NA is used, the normalized light intensity curve is further from the axis; it is also found the size of the focal spot is bigger and light beams focus in turbid media deeper. All above expound: the NA of the lens is larger; the radius of focal spot is larger in turbid media. In addition, it also suggests various factors including scattering, absorption and scalar diffraction etc must be taken into account when we choose the lens to focus in turbid media.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490O (9 June 2006); doi: 10.1117/12.674211
Show Author Affiliations
Jie Wang, Zhejiang Univ. (China)
Zhi-lie Tang, South China Normal Univ. (China)
Zu-kang Lu, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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