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Proceedings Paper

Fabrication of relief gratings on high photosensitive SiO2/ZrO2 gel film by UV exposure
Author(s): Xiang Xu; Bin Zhou; Chunze Liu; Chao Xu; Guangming Wu; Xingyuan Ni; Jun Shen
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Paper Abstract

SiO2/ZrO2 gel films were derived from Zr-butoxide modified chemically with β-diketones and then mixed with Tetraethyl orthosilicate via Sol-Gel process. The obtained gel films showed an absorption band, in characteristic of the π-&pi* transition of chelate ring at around 334 nm, and its refractive index was changed from 1.463~1.647. The Si-O-Zr, Zr-O bands were detected by FTIR. The result indicated that SiO2 and ZrO2 integrated uniformly in the films on micro molecule magnitude. The negative tone gel films were irradiated with high pressure mercury lamp through mask and then leached in ethyl alcohol. The above process gave uniform surface-relief gratings of periods at 2.0μm. The present study had proved that the photosensitive gel films were versatile for the fabrication of micro optical devices

Paper Details

Date Published: 9 June 2006
PDF: 6 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490N (9 June 2006); doi: 10.1117/12.674210
Show Author Affiliations
Xiang Xu, Tongji Univ. (China)
Bin Zhou, Tongji Univ. (China)
Chunze Liu, Tongji Univ. (China)
Chao Xu, Tongji Univ. (China)
Guangming Wu, Tongji Univ. (China)
Xingyuan Ni, Tongji Univ. (China)
Jun Shen, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies

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