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Proceedings Paper

Properties of carbon films by MCECR plasma sputtering
Author(s): Changlong Cai; Dongfeng Diao; Weihong Ma; Shoji Miyake
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Paper Abstract

The Mirror-Confinement-type Electron Cyclotron Resonance (MCECR) plasma source has high plasma density and high electron temperature, and it is quite useful for plasma processing, and has been used for etching and thin-film deposition. Carbon films have received much attention recently due to their interesting properties such as extreme hardness, high electrical resistivity, low coefficient of friction, superior mechanical properties, chemical inertness, biocompatibility, high transparency and chemical inertness, which are close to those of diamond. In this paper, the carbon films about 50nm thickness were deposited on Si (100) by MCECR plasma sputtering the sintered carbon target with the argon plasma, and its properties were studied. The bonding structure of the film was analyzed by using the x-ray photoelectron spectropscopy (XPS) and the nanostructure was evaluated with the high-resolution transmission electron microscopy (HRTEM). The tribological properties (friction coefficient, wear rate, and wear life) of the film are investigated by using the Pin-on-Disk tribometer under the conditions that the normal load is 1N and the sliding velocity is 0.05m/s. The nanohardness of the films was measured by using the nanoindenter under conditions that the maximum displacement is 30nm and the maximum load is 500μN. The surface morphology was studied by using the atomic force microscope (AFM).

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490F (9 June 2006); doi: 10.1117/12.674202
Show Author Affiliations
Changlong Cai, Xian Institute of Technology (China)
Dongfeng Diao, Xi'an Jiaotong Univ. (China)
Weihong Ma, Xian Institute of Technology (China)
Shoji Miyake, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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