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Proceedings Paper

Design and fabrication of antireflection coatings on ZnS substrate
Author(s): Xianjun Su; Weiguo Sun; Qingwang Wei; Yan Xu; Jiayuan He
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Paper Abstract

Zinc sulphide (ZnS), a significant Infrared (IR) optical material, is applied to window, lens and dome in many optoelectronic systems where a suitable antireflection (AR) and protective coating is required to enhance the transmission. In this paper, the transmittance characteristics and deposition process considerations of AR coatings on ZnS substrate are investigated in detail. Through the theoretical analyses and real process experience of common materials such as magnesium fluoride (MgF2), silicon dioxide (SiO2) and silicon monoxide (SiO), and the deposition and environmental test of yttria (Y2O3) coating, an optimum 5-layer structure is finally employed, which consists of a bonding layer with ZnS substrate, thin Y2O3 film, and a 4-layer stack of germanium (Ge) and SiO as high and low refractive index coating materials, respectively. Then, experimental implementation of the AR design is presented, especially the deposition of Y2O3, Ge and SiO materials. The fabricated coating conforms to the tests of humidity, temperature shock, abrasion and adhesion given in the MIL-C-48497 environmental stability standards and shows an average transmittance of 96% for a given application in 3-5μm wavelength region with a peak beyond 98% at 4.2μm on 3mm thick ZnS substrate. Moreover, due to stable deposition process of Ge and SiO, better AR coating with higher spectral transmission can be easily designed and fabricated through more layers of Ge and SiO.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614907 (9 June 2006); doi: 10.1117/12.674194
Show Author Affiliations
Xianjun Su, Photoelectron Development Ctr. (China)
Weiguo Sun, Photoelectron Development Ctr. (China)
Qingwang Wei, Photoelectron Development Ctr. (China)
Yan Xu, Photoelectron Development Ctr. (China)
Jiayuan He, Photoelectron Development Ctr. (China)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

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