Share Email Print
cover

Proceedings Paper

An estimation of Z-pinch plasma radiation source for EUVL by using artificial neural networks
Author(s): C. H. Zhang; C. C. Ji; J. G. Shi; S. Katsuki; A. Kimura; H. Fukumoto; H. Akiyama
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Non-equilibrium ionization plays a critical role in Z-pinch gas discharge produced plasma (GDPP) EUV source. However, the physics of the processes, plasma and surface discharges produced, magneto-hydrodynamic, photon radiation transport, and plasma-electrode interactions, which lead to EUV emission, is intrinsically complex. Many simplifying assumption are inevitable with numerical simulations, resulting in low-credibility outcomes. With the learning and generalization abilities, artificial neural networks (ANN) have been applied to model and optimize a Z-pinch plasma source, which is characterized with a experimental design at varied operational parameters including electric power input, applied voltage/current, pulse repetition, MPC parameters, electrode geometry, xenon flow rate as well as convention efficiency, EUV source size, radiation power etc.

Paper Details

Date Published: 9 June 2006
PDF: 5 pages
Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 614905 (9 June 2006); doi: 10.1117/12.674192
Show Author Affiliations
C. H. Zhang, Kumamoto Univ. (Japan)
C. C. Ji, Harbin Institute of Technology (China)
J. G. Shi, Northwest Polytechnic Univ. (China)
S. Katsuki, Kumamoto Univ. (Japan)
A. Kimura, Kumamoto Univ. (Japan)
H. Fukumoto, Kumamoto Univ. (Japan)
H. Akiyama, Kumamoto Univ. (Japan)


Published in SPIE Proceedings Vol. 6149:
2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Shangming Wen; Yaolong Chen; Ernst-Bernhard Kley, Editor(s)

© SPIE. Terms of Use
Back to Top