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Proceedings Paper

Resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining
Author(s): Manuel Flury; Nikolay Lyndin; Renate Fechner; Axel Schindler; Svetlen Tonchev; Michel Spajer; Youcef Ouerdane; Nathalie Destouches; David Pietroy; Stéphanie Reynaud; Olivier Parriaux
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Paper Abstract

Top hat diffraction efficiency in an all-dielectric SiO2/HfO2 grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining.

Paper Details

Date Published: 25 April 2006
PDF: 6 pages
Proc. SPIE 6187, Photon Management II, 61871I (25 April 2006); doi: 10.1117/12.668374
Show Author Affiliations
Manuel Flury, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)
Nikolay Lyndin, Institute of General Physics (Russia)
Renate Fechner, Institute of Surface Modification (Germany)
Axel Schindler, Institute of Surface Modification (Germany)
Svetlen Tonchev, Institute of Solid State Physics (Bulgaria)
Michel Spajer, Institut FEMTO-ST (France)
Youcef Ouerdane, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)
Nathalie Destouches, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)
David Pietroy, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)
Stéphanie Reynaud, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)
Olivier Parriaux, Lab. Traitement du Signal et de l’Instrumentation, CNRS, Univ. Saint Etienne (France)


Published in SPIE Proceedings Vol. 6187:
Photon Management II
John T. Sheridan; Frank Wyrowski, Editor(s)

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