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Proceedings Paper

Design and fabrication of W/Si multilayer mirrors for the K-edge of Ti
Author(s): Shumin Zhang; Zhanshan Wang; Hongchang Wang; Fengli Wang; Zhongxiang Gu; Wenjuan Wu; Zhong Zhang; Yao Xu; Shuji Qin; Lingyan Chen
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Paper Abstract

The periodic mulitlayer with high reflectivity and small full width at half maximum (FWHM) in hard x-ray range, while the reflectivity of non-periodic multilayer decreases and FWHM increase. Therefore, the optimum coating design must be found out as a compromise between the requirements for the reflectivity and the FWHM. We have used purely numerical techniques to design broad angular multilayer mirror in angle intervals (2.9°-3.1°), which is starting from an appropriate periodic multilayer structure. In our method, the risk of local minimization of the merit function disappears, because we refined the desired depth-distribution of the period using a direct numerical algorithm and the analytical solution as a starting point for computer calculation. The plateau reflectivity can be obtained in a few minutes. The main feature of our approach is the use of an analytical solution as a starting point for direct computer search, and the desired results can be given in a reasonable time. This technique is able to design almost any given reflectivity spectrum both energy- and angle-dependent and in a reasonable amount of time. The periodic and non-periodic W/Si multilayer for grazing incidence multilayer mirrors at the K-edge of Ti (0.275 nm) were both designed and fabricated by high vacuum DC magnetron sputtering coater model JGP560C6, and the multilayer films were characterized by X-ray reflectivity measurements on a laboratory x-ray diffractometer(XRD) and the atomic force microscope (AFM). We find good agreement of the changing trend of surface roughness between the simulation of XRD and measurement of AFM.

Paper Details

Date Published: 1 February 2006
PDF: 7 pages
Proc. SPIE 6034, ICO20: Optical Design and Fabrication, 60340C (1 February 2006); doi: 10.1117/12.668095
Show Author Affiliations
Shumin Zhang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)
Hongchang Wang, Tongji Univ. (China)
Fengli Wang, Tongji Univ. (China)
Zhongxiang Gu, Tongji Univ. (China)
Wenjuan Wu, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Yao Xu, Tongji Univ. (China)
Shuji Qin, Tongji Univ. (China)
Lingyan Chen, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 6034:
ICO20: Optical Design and Fabrication
James Breckinridge; Yongtian Wang, Editor(s)

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