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Proceedings Paper

Large area deposition technique of magnesium oxide thin film for plasma display panel applications
Author(s): Young-Wook Choi; Jeehyun Kim
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Paper Abstract

A higher rate deposition sputtering process of magnesium oxide thin film in oxide mode has been developed using a 20 kW unipolar pulsed power supply. The power supply was operated at a maximum constant voltage of 500 V and a constant current of 40 A. The frequency and the duty were changed in the ranges of 10 ~ 50 kHz and 10 ~ 60 %, respectively. The deposition rate increased with increasing incident power to the target. Maximum incident power to the magnesium target was obtained by the control of frequency, duty and current. The deposition rate of a moving state was 9 nm m/min at the average power of 1.5 kW. This result shows higher deposition rate than any other previous work of reactive sputtering at the oxide mode. The thickness uniformities over the whole substrate area of 982 mm x 563 mm were observed at the processing pressure of 2.8 ~ 9.5 mTorr. The thickness distribution was improved at lower pressure.

Paper Details

Date Published: 26 January 2006
PDF: 5 pages
Proc. SPIE 6030, ICO20: Display Devices and Systems, 603002 (26 January 2006); doi: 10.1117/12.667358
Show Author Affiliations
Young-Wook Choi, Korea Electrotechnology Research Institute (South Korea)
Jeehyun Kim, Korea Electrotechnology Research Institute (South Korea)


Published in SPIE Proceedings Vol. 6030:
ICO20: Display Devices and Systems
Tatsuo Uchida; Xu Liu; Hang Song, Editor(s)

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