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Proceedings Paper

Width of the apodization area in the case of diffractive optical elements with variable efficiency
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Paper Abstract

We present simulations of averaged intensity of light behind apodized phase masks. Two types of apodization profile were assumed: Gaussian and tanh. In reality, because of limitations of electron-beam exposure system used for phase mask fabrication, we simulated phase masks with eight values of step height. For comparison, the averaged intensity distributions behind ideal phase masks with variable intensity were also calculated. Simulations and description of intensity distribution perturbations due to phase jumps in real apodized phase masks were performed.

Paper Details

Date Published: 25 April 2006
PDF: 9 pages
Proc. SPIE 6187, Photon Management II, 61871G (25 April 2006); doi: 10.1117/12.667280
Show Author Affiliations
Tomasz Osuch, National Institute of Telecommunications (Poland)
Zbigniew Jaroszewicz, National Institute of Telecommunications (Poland)
Institute of Applied Optics (Poland)
Andrzej Kołodziejczyk, Warsaw Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 6187:
Photon Management II
John T. Sheridan; Frank Wyrowski, Editor(s)

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