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Proceedings Paper

Femtosecond laser pulse induced damage in thin films
Author(s): Haiyi Sun; Tianqing Jia; Xiaoxi Li; Chengbin Li; Donghai Feng; Shizhen Xu; Zhizhan Xu
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Paper Abstract

We have investigated the damage for ZrO2/SiO2 800 nm 45° high-reflection mirror and MgF2/ZnS 800 nm interference filter with femtosecond pulses. The damage morphologies and evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. We also report their single-short damage thresholds for pulse durations ranging from 50 fs to 900 fs, which depart from the diffusion-dominated τ1/2 scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements.

Paper Details

Date Published: 24 December 2005
PDF: 10 pages
Proc. SPIE 6028, ICO20: Lasers and Laser Technologies, 60281D (24 December 2005); doi: 10.1117/12.667187
Show Author Affiliations
Haiyi Sun, Shanghai Institute of Optics and Fine Mechanics (China)
Tianqing Jia, Shanghai Institute of Optics and Fine Mechanics (China)
Xiaoxi Li, Shanghai Institute of Optics and Fine Mechanics (China)
Chengbin Li, Shanghai Institute of Optics and Fine Mechanics (China)
Donghai Feng, Shanghai Institute of Optics and Fine Mechanics (China)
Shizhen Xu, Shanghai Institute of Optics and Fine Mechanics (China)
Zhizhan Xu, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 6028:
ICO20: Lasers and Laser Technologies
Y. C. Chen; Dianyuan Fan; Chunqing Gao; Shouhuan Zhou, Editor(s)

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