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Proceedings Paper

Application of photoresist melting method to the fabrication of holographic grating
Author(s): Wenhao Li; X. Bayanheshig; Chengshan Zhang; Jianxiang Gao; Hongzhu Yu; Yuguo Tang
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Paper Abstract

A new technique of reducing surface roughness of photoresist grating is presented. In this paper, photoresist melting method, which is low-cost, short-period and easy realization, is presented. In addition, the influence of photoresist melting on the groove profile of the photoresist grating is investigated. Experimental results show that the surface roughness reduces due to surface tension, when developed photoresist is heated to be melting state by this method. In experiment, when the melted photoresist grating is etched by ion beam, the surface relief grating possessing preferable groove profile is obtained on K9 glass substrate, then the surface is evaporated by aluminum using vacuum evaporation, holographic grating with preferable groove profile is successively fabricated.

Paper Details

Date Published: 9 December 2005
PDF: 6 pages
Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60242A (9 December 2005); doi: 10.1117/12.666956
Show Author Affiliations
Wenhao Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Chinese Academy of Sciences (China)
X. Bayanheshig, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Chengshan Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jianxiang Gao, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Hongzhu Yu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Yuguo Tang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 6024:
ICO20: Optical Devices and Instruments
James C. Wyant; X. J. Zhang, Editor(s)

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