Share Email Print

Proceedings Paper

Determining thin film thickness characterization using adaptive simulated annealing algorithm
Author(s): Yanping Chen; Yuling Liu; Peng Liu; Yingbo He; Feihong Yu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Thin film is very important in many industries. To perform the functions for which they were designed, the films must have proper thickness, roughness and other characteristics. These characteristics must often be measured, both during and after fabrication. Optical methods used to determining the characteristics of films are usually preferred because they are accurate, nondestructive and require little or no sample preparing. This paper introduces a new method of determining the thickness of thin films using Adaptive Simulated Annealing (ASA) algorithm. Based on the theory of thin film calculating, it uses the spectral reflectance data with the incident light perpendicular to the sample surface over a range of wavelengths to calculate the thickness of thin film. ASA is selected as a global optimization algorithm to characterize the thickness of thin film because it is good at dealing with the multimodal and nonsmooth cost function and it can converge quickly and accurately. The thicknesses of four thin film systems are calculated out to testify the correctness and efficiency of the method and the results are satisfying.

Paper Details

Date Published: 9 December 2005
PDF: 11 pages
Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 602416 (9 December 2005); doi: 10.1117/12.666850
Show Author Affiliations
Yanping Chen, Zhejiang Univ. (China)
Yuling Liu, Zhejiang Univ. (China)
Peng Liu, Zhejiang Univ. (China)
Yingbo He, Zhejiang Univ. (China)
Feihong Yu, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 6024:
ICO20: Optical Devices and Instruments
James C. Wyant; X. J. Zhang, Editor(s)

© SPIE. Terms of Use
Back to Top