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Proceedings Paper

Layout rule trends and effect upon CPU design
Author(s): Clair Webb
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Paper Abstract

The trends in layout rules and the affect these rules have upon design are described. The slow improvement in resolution has created a need for litho-friendly design. The problems caused by LFD and the increase in number and complexity of rules are shown. Issues in implementing LFD are discussed.

Paper Details

Date Published: 10 March 2006
PDF: 9 pages
Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615602 (10 March 2006); doi: 10.1117/12.664598
Show Author Affiliations
Clair Webb, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 6156:
Design and Process Integration for Microelectronic Manufacturing IV
Alfred K. K. Wong; Vivek K. Singh, Editor(s)

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