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Proceedings Paper

Metrological scanning probe microscope
Author(s): N. Dorozhovets; T. Hausotte; E. Manske; G. Jäger; N. Hofmann
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Paper Abstract

Today's technological progress calls for metrologically accurate object measurement, positioning and scanning with nanometre precision and over large measuring ranges. In order to meet that requirement a nanopositioning and nanomeasuring machine (NPM machine) was developed at the Institute of Process Measurement and Sensor Technology of the Technische Universitaet Ilmenau. This device is capable of highly exact long-range positioning and measurement of objects with a resolution of less than 0.1 nm. Due to the structure of the machine many different probe systems can be installed, including scanning probe microscopes (SPMs). A few SPMs have outstanding metrological characteristics and many commercial microscopes only perform as image acquisition tools. Commercial SPMs use piezoelectric actuators in order to move either the sample or the probe. The position measurement sometimes results from the applied voltage to the piezoelectric actuators or from the strain gauge or capacitive displacement sensor data. This means that they suffer from hysteresis, creep, nonlinear characteristics and Abbe offsets. For an accurate measurement the position of the cantilever must be measured in addition to the torsion and bending. The best solution is a combined detection system with a single laser beam. This system has been realized with a special interferometer system, in which the measuring beam is focused on the cantilever backside using a lens. The reflected beam is split with a part being detected by a quadrant photo-diode and the other part being fed back into the interferometer for position measurement. The quadrant photo-diode is used to detect the cantilever torsion and bending.

Paper Details

Date Published: 27 April 2006
PDF: 8 pages
Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 61880L (27 April 2006); doi: 10.1117/12.664407
Show Author Affiliations
N. Dorozhovets, Technische Univ. Ilmenau (Germany)
T. Hausotte, Technische Univ. Ilmenau (Germany)
E. Manske, Technische Univ. Ilmenau (Germany)
G. Jäger, Technische Univ. Ilmenau (Germany)
N. Hofmann, Technische Univ. Ilmenau (Germany)


Published in SPIE Proceedings Vol. 6188:
Optical Micro- and Nanometrology in Microsystems Technology
Christophe Gorecki; Anand K. Asundi; Wolfgang Osten, Editor(s)

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