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Proceedings Paper

Phase-shift focus monitoring techniques
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Paper Abstract

Depth of focus (DOF) has become a victim of its mathematical relationship with Numerical Aperture (NA). While NA is being increased towards one to maximize scanner resolution capabilities, DOF is being minimized because of its inverse relationship with NA. Moore's law continues to drive the semiconductor industry towards smaller and smaller devices the need for high NA to resolve these shrinking devices will continue to consume the usable depth of focus (UDOF). Due to the shrinking UDOF a demand has been created for a feature or technology that will give engineers the capability to monitor scanner focus. Developing and implementation of various focus monitoring techniques have been used to prevent undetected tool focus excursions. Two overlay techniques to monitor ArF Scanner focus have been evaluated; our evaluation results will be presented here.

Paper Details

Date Published: 20 March 2006
PDF: 9 pages
Proc. SPIE 6154, Optical Microlithography XIX, 615430 (20 March 2006); doi: 10.1117/12.663477
Show Author Affiliations
Matthew McQuillan, Infineon Technologies (United States)
Bill Roberts, Infineon Technologies (United States)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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