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Proceedings Paper

Measuring system for radiation pulses from gas-puff laser-plasma source
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Paper Abstract

The paper presents a measuring system of extreme ultraviolet radiation pulses (13.5 nm). The system is used for monitoring a gas-puff laser-plasma source constructed at the Institute of Optoelectronics. The radiation source and the system are used in metrology of EUV optics. The system consists of a detection head and a system of optical filters, which are housing in a special construction. Additional element of the measuring system is a special processing unit. The measuring system was used during investigations of the plasma-laser optimization. The results were comparable with the ones from a spectrograph and an Emon energy meter.

Paper Details

Date Published: 22 April 2006
PDF: 6 pages
Proc. SPIE 6189, Optical Sensing II, 618915 (22 April 2006); doi: 10.1117/12.663240
Show Author Affiliations
Zbigniew Bielecki, Military Univ. of Technology (Poland)
Janusz Mikołajczyk, Military Univ. of Technology (Poland)
Rafał Rakowski, Military Univ. of Technology (Poland)
Jacek Wojtas, Military Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 6189:
Optical Sensing II
Brian Culshaw; Anna G. Mignani; Hartmut Bartelt; Leszek R. Jaroszewicz, Editor(s)

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