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Proceedings Paper

Continuous writing technique of long gratings for metrological applications
Author(s): Emilie Gamet; Yves Jourlin; Stéphanie Reynaud; Jean-Claude Pommier; Olivier Parriaux
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Paper Abstract

The method presented here is an optical technique allowing the high productivity printing of long submicron period gratings by means of a phase mask illuminated by an intensity modulated laser beam. The continuous writing of the grating permits to avoid stitching errors and the fabrication of very long gratings. The main applications concern the fabrication of long optical scales for high resolution optical encoders. The experimental results presented here show 100 mm long resist gratings with 500 nm period.

Paper Details

Date Published: 27 April 2006
PDF: 6 pages
Proc. SPIE 6188, Optical Micro- and Nanometrology in Microsystems Technology, 618808 (27 April 2006); doi: 10.1117/12.662207
Show Author Affiliations
Emilie Gamet, TSI Lab., CNRS, Univ. Saint-Etienne (France)
Yves Jourlin, TSI Lab., CNRS, Univ. Saint-Etienne (France)
Stéphanie Reynaud, TSI Lab., CNRS, Univ. Saint-Etienne (France)
Jean-Claude Pommier, TSI Lab., CNRS, Univ. Saint-Etienne (France)
Olivier Parriaux, TSI Lab., CNRS, Univ. Saint-Etienne (France)


Published in SPIE Proceedings Vol. 6188:
Optical Micro- and Nanometrology in Microsystems Technology
Christophe Gorecki; Anand K. Asundi; Wolfgang Osten, Editor(s)

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