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Proceedings Paper

Development of the automatic recipe generation system for CD-SEM using design data
Author(s): Ryoichi Matsuoka; Atsushi Miyamoto; Wataru Nagatomo; Hidetoshi Morokuma; Takumichi Sutani
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Paper Abstract

This study examines the "Multifactor Layout Analysis Method: MLA Method" newly developed for automatically detecting an appropriate addressing point and an auto focus point in the automatic generation of a measurement recipe for CD-SEM using design data. The MLA method is a unique pattern shape evaluation method capable of searching for the optimum addressing and auto focus points with a higher speed and accuracy than by the conventional methods, depending on the detailed information about the shape of a semiconductor pattern, which is contained in the design data. A recipe using the result of search by the MLA method has the same performance as that of a recipe generated by an experienced operator. This paper outlines the MLA method and reports on the result of experiments by this method and its practical applicability.

Paper Details

Date Published: 24 March 2006
PDF: 11 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61524N (24 March 2006); doi: 10.1117/12.661936
Show Author Affiliations
Ryoichi Matsuoka, Hitachi High-Technologies Corp. (Japan)
Atsushi Miyamoto, Hitachi Ltd. (Japan)
Wataru Nagatomo, Hitachi Ltd. (Japan)
Hidetoshi Morokuma, Hitachi High-Technologies Corp. (Japan)
Takumichi Sutani, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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