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Proceedings Paper

Fabrication of large-area two-dimensional photonic crystals using interference lithography and direct writing of defects
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Paper Abstract

We have developed a process for the direct fabrication of two-dimensional photonic crystals (PC) on large area surfaces that allows creation of defects and defect lines in the PC. The technique is based on lithography and laser beam interference in standard photoresist (PR). In a first step, multiple exposures of interference fringes define a two-dimensional lattice of pillars. Then the light of a Hg lamp is focalized with a microscope to create defect lines using a piezoelectric table. After development, the structures are transferred into silicon layer, deposed onto a glass wafer substrate by plasma etching. The result is a photonic structure of Si pillars where the light is confined in the plane by the PC and out of the plane by wave-guiding.

Paper Details

Date Published: 20 April 2006
PDF: 9 pages
Proc. SPIE 6182, Photonic Crystal Materials and Devices III (i.e. V), 61821V (20 April 2006); doi: 10.1117/12.661921
Show Author Affiliations
Pierre-Yves Baroni, Univ. of Neuchâtel (Switzerland)
Toralf Scharf, Univ. of Neuchâtel (Switzerland)
Hans Peter Herzig, Univ. of Neuchâtel (Switzerland)


Published in SPIE Proceedings Vol. 6182:
Photonic Crystal Materials and Devices III (i.e. V)
Richard M. De La Rue; Pierre Viktorovitch; Ceferino Lopez; Michele Midrio, Editor(s)

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