Share Email Print
cover

Proceedings Paper

Nanolithography in thermally sacrificial polymers using nanoscale thermal probes
Author(s): Yueming Hua; Shubham Saxena; William P. King; Clifford L. Henderson
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper reports a novel lithography method that utilizes local nanoscale thermal decomposition of polycarbonate films using heated atomic force microscope cantilever probe tips. The effect of polycarbonate structure and physiochemical properties on the lithographic performance of the thermal writing process have been explored. It is observed that amorphous linear polycarbonates which possess glass transition temperatures lower than their decomposition temperature generally exhibit substantial thermal deformation during thermal writing. In contrast, thermal writing on crystalline regions of semi-crystalline linear polycarbonate films produced good pattern definition. However, the semi-crystalline nature of the film results in substantial surface topography in the thin film which is undesirable for high resolution patterning and the amorphous regions of the film still suffer from local thermal deformation during writing. Amorphous cross-linkable polycarbonate sacrificial polymers have been synthesized and are shown to be able to resist thermal deformation of features during writing and are shown capable of producing good patterned images using the heated AFM probe writing technique.

Paper Details

Date Published: 31 March 2006
PDF: 7 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61531G (31 March 2006); doi: 10.1117/12.661803
Show Author Affiliations
Yueming Hua, Georgia Institute of Technology (United States)
Shubham Saxena, Georgia Institute of Technology (United States)
William P. King, Georgia Institute of Technology (United States)
Clifford L. Henderson, Georgia Institute of Technology (United States)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

© SPIE. Terms of Use
Back to Top