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Proceedings Paper

Automated mask defect disposition system for reticle printability evaluation
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Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615234; doi: 10.1117/12.660845
Show Author Affiliations
William B. Howard, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

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