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Proceedings Paper

EUV generation from lithium laser plasma for lithography
Author(s): Simi A. George; William Silfvast; Kazutoshi Takenoshita; Robert Bernath; Chiew-Seng Koay; Greg Shimkaveg; Martin Richardson; Moza Al-Rabban; Howard Scott
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Paper Abstract

Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source for lithography. We have completed the evaluation of the potential of lithium as a laser-plasma source, both theoretically and experimentally. Theoretical calculations show optimum intensity region for lithium for attaining high conversion is close to 5.0 x 1011 W/cm2, with plasma temperature near 50 eV. Experimental studies compare directly, the conversion efficiency and optimum irradiation conditions for both planar tin and lithium solid targets. Best conversion efficiency found in this study is 2% for lithium, while CE measured is better than 4% for tin target at identical experimental conditions.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6151, Emerging Lithographic Technologies X, 615143 (24 March 2006); doi: 10.1117/12.660584
Show Author Affiliations
Simi A. George, Univ. of Central Florida (United States)
William Silfvast, Univ. of Central Florida (United States)
Kazutoshi Takenoshita, Univ. of Central Florida (United States)
Robert Bernath, Univ. of Central Florida (United States)
Chiew-Seng Koay, Univ. of Central Florida (United States)
Greg Shimkaveg, Univ. of Central Florida (United States)
Martin Richardson, Univ. of Central Florida (United States)
Moza Al-Rabban, Univ. of Qatar (Qatar)
Howard Scott, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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