Share Email Print
cover

Proceedings Paper

A dive into clear water: immersion defect capabilities
Author(s): B. Streefkerk; J. Mulkens; R. Moerman; M. Stavenga; J. van der Hoeven; C. Grouwstra; R. Bruls; M. Leenders; S. Wang; Y. van Dommelen; M. Boerema; H. Jansen; K. Cummings; M. Riepen; H. Boom; M. Suddendorf; P. Huisman
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper discusses the types and formation of immersion defects. It is shown that drying stains and water marks are the main immersion defects. The immersion defects are related to resist leaching, water penetration and droplet formation. It is shown that scanner immersion hood design based on an actuated air gap and air curtain droplet clean-up minimizes defect counts. Additionally, pre-and post soaks steps in the track can reduce drying stains and water marks. The defect performance is evaluated on XT:1250i and XT:1400i systems. It is shown that the immersion defect density can go as low as 0.01 /cm2, which is well below the ITRS 2005 number of 0.03 /cm2.

Paper Details

Date Published: 15 March 2006
PDF: 13 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61540S (15 March 2006); doi: 10.1117/12.660376
Show Author Affiliations
B. Streefkerk, ASML Netherlands B.V. (Netherlands)
J. Mulkens, ASML Netherlands B.V. (Netherlands)
R. Moerman, ASML Netherlands B.V. (Netherlands)
M. Stavenga, ASML Netherlands B.V. (Netherlands)
J. van der Hoeven, ASML Netherlands B.V. (Netherlands)
C. Grouwstra, ASML Netherlands B.V. (Netherlands)
R. Bruls, ASML Netherlands B.V. (Netherlands)
M. Leenders, ASML Netherlands B.V. (Netherlands)
S. Wang, ASML Netherlands B.V. (Netherlands)
Y. van Dommelen, ASML Netherlands B.V. (Netherlands)
M. Boerema, ASML Netherlands B.V. (Netherlands)
H. Jansen, ASML Netherlands B.V. (Netherlands)
K. Cummings, ASML Netherlands B.V. (Netherlands)
M. Riepen, ASML Netherlands B.V. (Netherlands)
H. Boom, ASML Netherlands B.V. (Netherlands)
M. Suddendorf, ASML Netherlands B.V. (Netherlands)
P. Huisman, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

© SPIE. Terms of Use
Back to Top