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Proceedings Paper

Optimized precision micromachining using commercially available high-repetition rate microjoule femtosecond fiber lasers
Author(s): Michelle L. Stock; Lawrence Shah; Bing Liu; Makoto Yoshida; Fumiyo Yoshino; James Bovatsek; Alan Arai
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Paper Abstract

Fiber lasers offer an excellent technology base for production of an industrial-quality tool for precision microfabrication, answering the need to expand the capabilities of laser material processing beyond traditional welding, cutting, and other industrial processes. IMRA's FCPA μJewelTM femtosecond fiber laser has been developed to address the particular need for direct-write lasers for creation of clean and high-quality micron and sub-micron features in materials of commercial interest. This flexible Yb:fiber chirped-pulse amplification architecture, capable of operating at rep-rates between 100 kHz and 5 MHz, balances the need for higher-repetition rate with that of sufficient pulse energy to work at or near ablation threshold, while meeting industrial standards for temperature, shock and vibration. Demonstration of the need for higher-repetition rates for direct write processes will be provided in this paper. Further, results of laser-processing of materials typically used in flat panel displays, photomasks, and waveguide production using the FCPA μJewelTM laser will be presented.

Paper Details

Date Published: 28 February 2006
PDF: 9 pages
Proc. SPIE 6108, Commercial and Biomedical Applications of Ultrafast Lasers VI, 61080Q (28 February 2006); doi: 10.1117/12.659866
Show Author Affiliations
Michelle L. Stock, IMRA America, Inc. (United States)
Lawrence Shah, IMRA America, Inc. (United States)
Bing Liu, IMRA America, Inc. (United States)
Makoto Yoshida, AISIN SEIKI Co., Ltd. (Japan)
Fumiyo Yoshino, IMRA America, Inc. (United States)
James Bovatsek, IMRA America, Inc. (United States)
Alan Arai, IMRA America, Inc. (United States)

Published in SPIE Proceedings Vol. 6108:
Commercial and Biomedical Applications of Ultrafast Lasers VI
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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