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Proceedings Paper

A new imprint process designed for patterning non-flat substrates
Author(s): Michael P.C. Watts; Michael L. Miller; Nick Stacey; Jin Choi; Maha Subramanian; Sidlgata V. Sreenivasan
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Paper Details

Date Published:
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Proc. SPIE 6151, Emerging Lithographic Technologies X, 615118; doi: 10.1117/12.659657
Show Author Affiliations
Michael P.C. Watts, Molecular Imprints, Inc. (United States)
Michael L. Miller, Molecular Imprints, Inc. (United States)
Nick Stacey, Molecular Imprints, Inc. (United States)
Jin Choi, Molecular Imprints, Inc. (United States)
Maha Subramanian, Molecular Imprints, Inc. (United States)
Sidlgata V. Sreenivasan, Molecular Imprints, Inc. (United States)


Published in SPIE Proceedings Vol. 6151:
Emerging Lithographic Technologies X
Michael J. Lercel, Editor(s)

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