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Proceedings Paper

Study of the effect of amine additives on LWR and LER
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Paper Abstract

We will give an account of our investigation on structure property relationships of amines with regards to line width roughness (LWR) and line edge roughness (LER) of a 193 nm alicyclic-acrylate resist. Specifically, we have looked at basicity, molar volume and logD as factors which may have an influence of roughness of 80 nm 1:1 L/S features. For relatively hydrophobic amines (Log D > -1), the lower the hydrophilicity at acidic pH the greater the LER and LWR becomes. Specifically, in this range of Log D, more hydrophobic larger amines, with higher basicity, tend to give worse L/S feature roughness. For amines which are more hydrophilic, the relationship becomes more complex with some amines giving a lower LER while others do not. This appears to be predicated on a delicate balance between basicity, hydrophilicy and size.

Paper Details

Date Published: 29 March 2006
PDF: 10 pages
Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 615317 (29 March 2006); doi: 10.1117/12.659465
Show Author Affiliations
Francis M. Houlihan, AZ Electronic Materials (United States)
David Rentkiewicz, AZ Electronic Materials (United States)
Guanyang Lin, AZ Electronic Materials (United States)
Dalil Rahman, AZ Electronic Materials (United States)
Douglas Mackenzie, AZ Electronic Materials (United States)
Allen Timko, AZ Electronic Materials (United States)
Takanori Kudo, AZ Electronic Materials (United States)
Clement Anyadiegwu, AZ Electronic Materials (United States)
Muthiah Thiyagarajan, AZ Electronic Materials (United States)
Simon Chiu, AZ Electronic Materials (United States)
Andrew Romano, AZ Electronic Materials (United States)
Ralph R. Dammel, AZ Electronic Materials (United States)
Munirathna Padmanaban, AZ Electronic Materials (United States)


Published in SPIE Proceedings Vol. 6153:
Advances in Resist Technology and Processing XXIII
Qinghuang Lin, Editor(s)

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