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Proceedings Paper

LIS design for optimum efficiency
Author(s): Lev Ryzhikov; Yuli Vladimirsky
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Paper Abstract

This paper presents an approach to Laser Illumination System (LIS) efficiency optimization for High Numerical Aperture (NA) Microlithography exposure tools. These advanced tool are immersion systems with NA>1 utilizing many Reticle Enhancement Techniques (RET). In order to provide maximum efficiency, especially for high NA systems, the following conditions have been taken into consideration: étendue law for LIS subsystems consisting of sequential optics; proper relations between transverse and longitudinal dimensions of optical path; laser light coherence management by overlap of individual exposure fields generated from different parts of the laser beam; polarization management; flexible illumination partial coherence (PC) management; illumination relay and condenser systems have to be optically matched in order to minimize: pupil ellipticity, field vigneting, and non-telecentricity. Individual importance of listed conditions and their parameters will be explained and discussed as applied to illumination systems with high NA.

Paper Details

Date Published: 15 March 2006
PDF: 8 pages
Proc. SPIE 6154, Optical Microlithography XIX, 61542I (15 March 2006); doi: 10.1117/12.659107
Show Author Affiliations
Lev Ryzhikov, ASML (United States)
Yuli Vladimirsky, ASML (United States)

Published in SPIE Proceedings Vol. 6154:
Optical Microlithography XIX
Donis G. Flagello, Editor(s)

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