Share Email Print
cover

Proceedings Paper

Metrology delay time reduction in lithography via small-lot wafer transport
Author(s): Vinay K. Shah; Eric A. Englhardt; Sushant Koshti; Helen R. Armer
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A small lot Automated Material Handling System (AMHS) is presented as a method to reduce the time between wafer exposure at a photolithography tool and collection of metrology / inspection data. A new AMHS system that is capable of the move rates required by small lot wafer transport is described, its implementation in a photolithography bay is explained, and the resulting reduction in metrology delay time is quantified. In addition, a phased implementation approach is described in which some, but not all, components of the new AMHS would be installed in existing fabs to enhance the move rate capability of traditional overhead transport (OHT) AMHS systems. This partial implementation would enable a partial lot size reduction and corresponding metrology delay time reduction of 60-70%. The full AMHS solution would be installed in new fabs and enable true small lot manufacturing in the litho area and would result in the maximum delay time reduction of 75-85%.

Paper Details

Date Published: 24 March 2006
PDF: 8 pages
Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523J (24 March 2006); doi: 10.1117/12.657964
Show Author Affiliations
Vinay K. Shah, Applied Materials (United States)
Eric A. Englhardt, Applied Materials (United States)
Sushant Koshti, Applied Materials (United States)
Helen R. Armer, Applied Materials (United States)


Published in SPIE Proceedings Vol. 6152:
Metrology, Inspection, and Process Control for Microlithography XX
Chas N. Archie, Editor(s)

© SPIE. Terms of Use
Back to Top